Photoresist Optimization for Lead Zirconate Titanate (PZT) Processing and Devices

Author(s):

Daniel M Potrepka

Abstract:

. ABSTRACT This study focused on resolving defects in photoresist patterns after UV curing that affect device feature quality and electromechanical performance. Designs of experiments (DOEs) were performed to obtain photoresist profiles for the AZ 5214 positive photoresist process with a 2,000-rpm spin during dispense. These profiles were then analyzed by a confocal microscope, a stylus profilometer, and scanning electron microscopy. The specific problems with the patterns revealed by the DOE and analysis are discussed. A plan forward is then discussed listing options that could lead to further photoresist and device–feature optimization for enhanced performance.